Characterisation data for electroless nickel deposition on graphene

This work investigated the potential of electroless nickel deposition to form ohmic contacts on single layer graphene. The data represents I-V (current-voltage) traces and corresponding resistance for electrical contacts formed on the graphene surface, chemical composition maps of the contacts, Raman data detailing the quality of the graphene surface before and after processing and X-ray diffraction data quantifying the degree of crystallinity of the deposited nickel contact. Measurements were taken with Agilent B1500, K-Alpha XPS, Horiba Jobin Yvon LabRAM HR800, Bruker D8 ADVANCE systems respectively. The data is as recorded with additional processing outlined in the data files.